Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Sonia Cafieri, Jon Lee, et al.
Journal of Global Optimization
John R. Kender, Rick Kjeldsen
IEEE Transactions on Pattern Analysis and Machine Intelligence
W.C. Tang, H. Rosen, et al.
SPIE Optics, Electro-Optics, and Laser Applications in Science and Engineering 1991