Q. Ouyang, S.J. Koester, et al.
SISPAD 2003
A new method for measuring the output (ID-VD) characteristics of SOI MOSFET's without self-heating is described. The method uses short pulses with a low repetition rate, and a reverse transient loadline construction. The technique is demonstrated by measuring 0.25 µm bulk and SOI MOSFET's with 5-nm gate oxide. Application of the method to the extraction of device temperature as a function of dc power is also illustrated. © 1995 IEEE
Q. Ouyang, S.J. Koester, et al.
SISPAD 2003
J.N. Burghartz, M. Soyuer, et al.
IEDM 1995
J. Gautier, Keith A. Jenkins, et al.
IEDM 1995
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