American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Conference paper

01 Mar 1998

Microlithographic applications of silicon-containing polymers and individual organosilicon compounds

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The use of organosilicon polymers in multilayer plasma resist processing

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Comparison of vapor and liquid phase silylation processes of photoresists

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A comparison of the E-beam sensitivities and relative O₂-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers

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A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers

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