American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

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01 Mar 1998

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A comparison of the E-beam and UV-sensitivities and relative O₂- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups

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Cross-linking of poly{1,1-diaryl(alkyl,aryl) 1-silacyclobutanes} under electron beam and deep UV irradiation

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American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

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