Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We consider offline algorithms for minimizing the total flow time on O(1) machines where jobs can be preempted arbitrarily but migrations are disallowed. Our main result is a quasi-polynomial time approximation scheme for minimizing the total flow time. We also consider more general settings and give some hardness results. © 2004 Elsevier B.V. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Fausto Bernardini, Holly Rushmeier
Proceedings of SPIE - The International Society for Optical Engineering
Trang H. Tran, Lam Nguyen, et al.
INFORMS 2022
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SPIE Advanced Lithography 2010