Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
CMOS-compatible III-V lasers integrated on silicon are a crucial step to reduce power consumption and cost for next-generation optical transceivers. Here, we demonstrate a concept to co-integrate III-V lasers into a CMOS Silicon Photonics platform, in which lasers, photonics, and electronic circuitry share the same back end of line. Based on a bonded III-V epitaxial layer stack, ultra-thin laser devices, optically pumped lasing and coupling to silicon are demonstrated. Furthermore, we present all building blocks for electrically pumped laser devices.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Simon Hönl, Katharina Schneider, et al.
CLEO 2018
Katharina Schneider, Pol Welter, et al.
Journal of Lightwave Technology
Alessandro Cevrero, Ilter Ozkaya, et al.
OFC 2018