Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The d=3 planar model is analyzed for the first time with the Monte Carlo renormalization-group (MCRG) method. To increase the efficiency of the calculation, an operator is introduced in analogy with the "vacancy" operator used in the MCRG analysis of the q=4 Potts model. This operator is shown to be important in understanding the effect of the renormalization transformation on the Hamiltonian, and in improving the convergence of the method. © 1983 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
J.C. Marinace
JES
William G. Van der Sluys, Alfred P. Sattelberger, et al.
Polyhedron