Hiroshi Ito, Reinhold Schwalm
JES
Using high-resolution core-level spectroscopy we show that up to four different oxidation states of silicon coexist even at monolayer oxygen coverage. This observation precludes current models with a single adsorption geometry. Below 0.2 monolayer coverage, a single oxidation state is seen but the (100) surface has an oxygen-bonding geometry different from the (111) surface evidenced by different valence states and work-function changes. © 1983 The American Physical Society.
Hiroshi Ito, Reinhold Schwalm
JES
R.W. Gammon, E. Courtens, et al.
Physical Review B
J.Z. Sun
Journal of Applied Physics
R. Ghez, J.S. Lew
Journal of Crystal Growth