J. Paraszczak, E. Babich, et al.
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Electron penetration and scattering in solids can be measured by electron beam exposure of a positive electron resist. The beam profile is obtained by exposing a long line of controlled width in a thick layer of poly-(methyl methacrylate) resist. The cross section of the developed line which can be examined in the scanning electron microscope represents the beam density profile. © 1971 The American Institute of Physics.
J. Paraszczak, E. Babich, et al.
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
M. Hatzakis, K.J. Stewart, et al.
JES
M. Hatzakis
JES
K.J. Stewart, M. Hatzakis, et al.
SPE Regional Technical Conference 1988