Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Paper
NP-completeness of some generalizations of the maximum matching problem
Abstract
No abstract available.
Related
M.F. Cowlishaw
IBM Systems Journal
S.M. Sadjadi, S. Chen, et al.
TAPIA 2009
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010