Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
We prove several theorems about automorphisms of Markov chains, using the weight-per-symbol polytope. © 1992 by American Mathematical Society.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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BMC Bioinformatics
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Electronic Imaging: Advanced Devices and Systems 1990