Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We study an M/M/1 queueing system under the shortest remaining processing time (SRPT) policy. We show that the average sojourn time varies as Θ((μ(1-ρ) ln(e/(1-ρ)))-1), where ρ is the system load. Thus, SRPT offers a Θ(ln(e/(1-ρ))) factor improvement over policies that ignore knowledge of job sizes while scheduling. © 2004 Elsevier B.V. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
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IEEE Transactions on Pattern Analysis and Machine Intelligence
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INFORMS 2022