Mario Blaum, John L. Fan, et al.
IEEE International Symposium on Information Theory - Proceedings
Paper
On the covering of polyhedra by polyhedra
Abstract
No abstract available.
Related
Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Conference paper
Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009