Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The BSMSn source is addressed in this study. It is shown that BSMSn is not successively refinable under the Hamming distortion measure, provided that n > 2.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Shashanka Ubaru, Lior Horesh, et al.
Journal of Biomedical Informatics
Chai Wah Wu
Linear Algebra and Its Applications
Charles Micchelli
Journal of Approximation Theory