Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This paper is concerned with solving systems of partial difference equations which arise when studying linear dependence of translates of box splines. © 1985 American Mathematical Society.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
R.A. Brualdi, A.J. Hoffman
Linear Algebra and Its Applications
David W. Jacobs, Daphna Weinshall, et al.
IEEE Transactions on Pattern Analysis and Machine Intelligence
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985