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ACS Macro Letters
We describe how the unique capabilities of molecular beam epitaxy together with the electron-beam lithography and reactive-ion etching can be utilized to realize novel quasi-one- and zero-dimensional electron systems. We also present the results of capacitive and tunneling studies on these quantum systems. © 1989.
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
A. Reisman, M. Berkenblit, et al.
JES
Revanth Kodoru, Atanu Saha, et al.
arXiv
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering