PaperPolymer degradation in reactive ion etching and its possible application to all dry processesH. Hiraoka, L.W. Welsh Jr.Radiation Physics and Chemistry
Conference paperDEEP UV PHOTOLITHOGRAPHY WITH COMPOSITE PHOTORESISTS MADE OF POLY(OLEFIN SULFONES).H. Hiraoka, L.W. Welsh Jr.ACS National Meeting 1983
PaperSoft vacuum, pulsed electron-beam hardening of lithographic polymersJ. Krishnaswamy, L. Li, et al.Journal of Materials Research