Conference paperDEEP UV PHOTOLITHOGRAPHY WITH COMPOSITE PHOTORESISTS MADE OF POLY(OLEFIN SULFONES).H. Hiraoka, L.W. Welsh Jr.ACS National Meeting 1983
PaperAll Dry Lithography Processes and Mechanistic Studies with Poly(methacrylonitrile) and Related PolymersH. HiraokaJES
Conference paperHigh resolution polymer pattern fabrications with Low energy proton beamsH. HiraokaMicrolithography 1984
Conference paperSub-halfmicron negative resist systems by image reversalK. Chiong, H. HiraokaProceedings of SPIE 1989