Pitting of Sputtered Aluminum Alloy Thin Films

A number of Al binary alloy thin films were studied over a range of composition up to 40% solute using a co-sputtering technique with the substrates at room temperature. These Al alloy films were tested in 0.1 M NaCl and found to have extraordinary pitting resistance. © 1989, The Electrochemical Society, Inc. All rights reserved.