E.C. Jones, S. Tiwari, et al.
IEEE International SOI Conference 1998
A simple technique for making intermetallic resistors of sheet resistance around 25 Ω/□ is described. The resistors were formed by reacting a 300 Å film of platinum with underlying GaAs to completion. PtGa, PtGa2 and PtAs2 phases were identified in the temperature range of 450°C to 550°C investigated. The temperature coefficient of resistivity was of the order of +9.2 × 10-4°C-1 at 25°C and the resistors appeared to be stable up to current densities of 105 A/cm2. © 1985, The Institution of Electrical Engineers. All rights reserved.
E.C. Jones, S. Tiwari, et al.
IEEE International SOI Conference 1998
S. Tiwari
IEDM 1985
P.E. Hallali, Masanori Murakami, et al.
Journal of Applied Physics
H.-J. Kim, Masanori Murakami, et al.
Journal of Applied Physics