Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Policies that address security and privacy are pervasive parts of both technical and social systems, and technology that enables both organizations and individuals to create and manage such policies is a critical need in information technology (IT). This paper describes the notion of end-to-end policy management and advances a framework that can be useful in understanding the commonality in IT security and privacy policy management. © Copyright 2009 by International Business Machines Corporation.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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