Conference paper
Polysilanes. Radiation sensitive materials for microlithography
R.D. Miller
ACS Division of Polymer Chemistry Washington DC Meeting 1990
No abstract available.
R.D. Miller
ACS Division of Polymer Chemistry Washington DC Meeting 1990
J.L. Hedrick, S.A. Srinivasan, et al.
MRS Spring Meeting 1996
S.V. Nitta, S. Purushothaman, et al.
IEDM 2004
R.D. Miller, D. Kaufmann
Journal of the Chemical Society, Chemical Communications