John G. Long, Peter C. Searson, et al.
JES
A set of key processes for nanometer-scale pattern transfer using a self-assembled polymer mask was developed and integrated. As a result, a variety of silicon nanostructures were built.
John G. Long, Peter C. Searson, et al.
JES
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
K.A. Chao
Physical Review B