David B. Mitzi
Journal of Materials Chemistry
Analogues of poly(methyl methacrylate) (PMMA) incorporating halogen atoms in the α-position or in the ester side group have recently attracted much attention as sensitive electron-beam positive resists. Ito et al. have reported that methyl α-(trifluoromethyl)acrylate(MTFMA) does not undergo radical homopolymerization but readily polymerizes bypyridine initiation due to the low electron density on the double bond. © 1984, American Chemical Society. All rights reserved.
David B. Mitzi
Journal of Materials Chemistry
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications