Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
We present an improvement to the cross resonance gate realized with the addition of resonant, target rotary pulses. These pulses, applied directly to the target qubit, are simultaneous to and in phase with the echoed cross resonance pulses. Using specialized Hamiltonian error amplifying tomography, we confirm a reduction of error terms with target rotary - directly translating to improved two-qubit gate fidelity. Beyond improvement in the control-target subspace, the target rotary reduces entanglement between target and target spectators caused by residual quantum interactions. We further characterize multiqubit performance improvement enabled by target rotary pulsing using unitarity benchmarking and quantum volume measurements, achieving a new record quantum volume for a superconducting qubit system.
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Andrew Skumanich
SPIE Optics Quebec 1993
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Robert Manson Sawko, Malgorzata Zimon
SIAM/ASA JUQ