Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
No abstract available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
M. Shub, B. Weiss
Ergodic Theory and Dynamical Systems
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Igor Devetak, Andreas Winter
ISIT 2003