Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We present a simple algorithm for approximating all roots of a polynomial p(x) when it has only real roots. The algorithm is based on some interesting properties of the polynomials appearing in the Extended Euclidean Scheme for p(x) and p′(x). For example, it turns out that these polynomials are orthogonal; as a consequence, we are able to limit the precision required by our algorithm in intermediate steps. A parallel implementation of this algorithm yields a P-uniform NC2 circuit, and the bit complexity of its sequential implementation is within a polylog factor of the bit complexity of the best known algorithm for the problem. © 1990.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997