Y.Y. Li, K.S. Leung, et al.
J Combin Optim
Paper
Stresses in a transversely isotropic elastic cone under an asymmetric force at its vertex
Abstract
No abstract available.
Related
Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A.R. Conn, Nick Gould, et al.
Mathematics of Computation
Conference paper
Optimization of real phase-mask performance
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991