Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We consider the eigenvalue problem u″ + λϕ = 0, u(0)=u(1) = 0, where ϕεin C[0, 1] is positive. It is well known that the eigenfunctions corresponding to distinct eigenvalues are linearly independent. It is shown in this paper that the squares of the eigenfunctions may be linearly dependent on nontrivial subintervals of [0,1]. This result has relevance in the variational analysis of eigenvalue problems. Copyright © 1980 Wiley Periodicals, Inc., A Wiley Company
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
John R. Kender, Rick Kjeldsen
IEEE Transactions on Pattern Analysis and Machine Intelligence
Richard M. Karp, Raymond E. Miller
Journal of Computer and System Sciences
Michael E. Henderson
International Journal of Bifurcation and Chaos in Applied Sciences and Engineering