Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Paper
Summary abstract: The low-temperature reactivity of Si(100) with NH3 and NO: Rate determining steps and rate enhancement via electronic excitations
Abstract
No abstract available.
Related
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
K.A. Chao
Physical Review B
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering