Chemical Reviews

Paper

20 Jun 1996

Surface chemistry in the chemical vapor deposition of electronic materials

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Abstract

No abstract available.

Paper

Corrosion in low dielectric constant Si-O based thin films: Buffer concentration effects

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Sequential Lateral Solidification of Silicon Thin Films on Cu BEOL-Integrated Wafers for Monolithic 3-D Integration

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IEEE T-ED

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Effect of low-frequency radio frequency on plasma-enhanced chemical vapor deposited ultra low-κ dielectric films for very large-scale integrated interconnects

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Adsorption kinetics of SiH₄, Si₂H₆ and Si₃H₈ on the Si(111)-(7×7) surface

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