Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
The capacity of future high-density magnetic recording systems is expected to be limited primarily by "jitter". For such systems, a new simple channel model is proposed. A factor graph representation as well as upper and lower bounds on the capacity of this channel model are given.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Matthew A Grayson
Journal of Complexity
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
John R. Kender, Rick Kjeldsen
IEEE Transactions on Pattern Analysis and Machine Intelligence