Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Paper
The Bounded Linear Operators that Commute with the Bernstein Operators
Abstract
No abstract available.
Related
Naga Ayachitula, Melissa Buco, et al.
SCC 2007
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Conference paper
Placement of multimedia blocks on zoned disks
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996