Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Hopscotch, a fast finite difference technique, is used to solve parabolic and elliptic equations in two space dimensions with a mixed derivative. The method is compared numerically with existing alternating direction implicit (A.D.I.) and locally one dimensional (L.O.D.) methods for simple problems. Douglas and Gunn's A.D.I. method is both simplified and improved by reformulating it as a hopscotch method. © 1977, All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
John S. Lew
Mathematical Biosciences
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Yi Zhou, Parikshit Ram, et al.
ICLR 2023