Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper contributes to the area of computation in the production of artistic form. The author-artist describes a computational system in the form of a curvilinear, parametric shape grammar. based on an analysis of over 3,000 entries in her traditionally hand-drawn sketchbooks, she describes the grammar that synthesizes drawings in the design language of her evolving style and serves as a tool for self-understanding of her artistic process.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Kaoutar El Maghraoui, Gokul Kandiraju, et al.
WOSP/SIPEW 2010
Chi-Leung Wong, Zehra Sura, et al.
I-SPAN 2002
Nanda Kambhatla
ACL 2004