Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper contributes to the area of computation in the production of artistic form. The author-artist describes a computational system in the form of a curvilinear, parametric shape grammar. based on an analysis of over 3,000 entries in her traditionally hand-drawn sketchbooks, she describes the grammar that synthesizes drawings in the design language of her evolving style and serves as a tool for self-understanding of her artistic process.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Rajiv Ramaswami, Kumar N. Sivarajan
IEEE/ACM Transactions on Networking
Nanda Kambhatla
ACL 2004
Rafae Bhatti, Elisa Bertino, et al.
Communications of the ACM