P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Calculations based on our modified point-ion electrostatic model of the multilayer relaxation expected on a stepped Cu{410} surface predict an average edge-atom depression normal to the surface of 0.15 Å. This value is in good agreement with the results obtained in another laboratory with ion-scattering experiments yielding 0.18±0.05 Å, but disagrees with the results obtained elsewhere with kinematic LEED analysis, which revealed no measurable edge-atom depression. © 1987.
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
David B. Mitzi
Journal of Materials Chemistry