R. Ghez, J.S. Lew
Journal of Crystal Growth
A very simple derivation is given of the ionization probability P − for negative ions sputtered off a metal surface. The result P −≈e−(ϕ−A)/cv⊥ shows the experimentally observed dependences on work function ϕ, atomic affinity A, and outwards velocity v ⊥. Estimates of c show good agreement with experiment, too. The physical picture behind the process is discussed. © 1983 IOP Publishing Ltd.
R. Ghez, J.S. Lew
Journal of Crystal Growth
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Macromolecules
K.A. Chao
Physical Review B
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SPIE Advanced Lithography 2010