Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A tool for helping system engineers configure VM/370 systems Is described It consists of,a data reductmn package that produces a workload characterization from VM/370,Momtor data, and an analytic model that accepts the workload characterlzatmn as an,input, and provides estimated performance measures as outputs The tool is easy to use,and routinely achmves accuracy levels within 5 percent for utihzatmns and 30 percent for,response times. © 1978, ACM. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Xinyi Su, Guangyu He, et al.
Dianli Xitong Zidonghua/Automation of Electric Power Systems
John M. Boyer, Charles F. Wiecha
DocEng 2009
Fan Zhang, Junwei Cao, et al.
IEEE TETC