F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
Measurements of thermoelectric power versus temperature of (CH)x doped with various concentrations of AsF5 are reported. These reflect the semiconductor-metal transition at ∼ 1% doping. The "pristine" thermopower is consistent with the conductivity-derived activation energy of 0.35 eV, and a residual defect/impurity carrier concentration of 0.1%. An analysis of the conductivity based on these data indicates that, while the disorder is certainly important, it is not the cause of the transition. © 1980.
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
P. Alnot, D.J. Auerbach, et al.
Surface Science
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP