G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
Thin film deposition with physical vapor deposition (PVD) and related technology was studied. Variations of PVD processes include thermal evaporation, physical sputtering, laser ablation and arc-based emission. The modifications included reactive sputter deposition, the unbalanced magnetron, collimated and ionized sputter deposition.
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
H.D. Dulman, R.H. Pantell, et al.
Physical Review B