Ellen J. Yoffa, David Adler
Physical Review B
Thin film deposition with physical vapor deposition (PVD) and related technology was studied. Variations of PVD processes include thermal evaporation, physical sputtering, laser ablation and arc-based emission. The modifications included reactive sputter deposition, the unbalanced magnetron, collimated and ionized sputter deposition.
Ellen J. Yoffa, David Adler
Physical Review B
David B. Mitzi
Journal of Materials Chemistry
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993