J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
Paper
Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films
Abstract
Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented. © 1982.
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