J. Photopolym. Sci. Tech.

Review

21 Nov 2007

Trends in patterning materials for advanced lithography

Abstract

The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists. ©2007TAPJ.

Conference paper

Formation mechanism and suppression methods of copper dendrites in BEOL integration

Shaoning Yao, Wei-Tsu Tseng, et al.

ADMETA 2011

Paper

Radical polymerization of N‐phenyl‐α‐methylene‐β‐lactam

Mitsuru Ueda, Hideharu Mori, et al.

Journal of Polymer Science Part A: Polymer Chemistry

Paper

(S)PEEC: Time- and Frequency-Domain Surface Formulation for Modeling Conductors and Dielectrics in Combined Circuit Electromagnetic Simulations

Dipanjan Gope, Albert E. Ruehli, et al.

IEEE T-MTT

Paper

Characterization of large magnetic anisotropies in (100)- and (111)-oriented Co/Pt multilayers by Brillouin light scattering

J.V. Harzer, B. Hillebrands, et al.

Journal of Magnetism and Magnetic Materials

View all publications