Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
Review
Trends in patterning materials for advanced lithography
Abstract
The emerging trends in photoresists and advanced patterning materials are described, including functional fluoropolymers, molecular glasses, and imprint resists. ©2007TAPJ.
Related
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
J. Tersoff
Applied Surface Science
M.A. Lutz, R.M. Feenstra, et al.
Surface Science