W.P. Risk, J.-C. Baumert, et al.
CLEO 1987
Chain scission induced by two-photon exposure produces a permanent birefringence in polysilane polymer films, which can be used for the formation of birefringent optical elements. Spectroscopy of the effect for poly(di-n-hexylsilane) reveals an unexpected sharp resonance at 580 nm. A comparison of several polysilanes indicates the effect only occurs in polymers with symmetric or near symmetric sidegroups. Models to explain these observations are introduced and discussed. © 1990.
W.P. Risk, J.-C. Baumert, et al.
CLEO 1987
R.J. Twieg, D.M. Burland, et al.
MRS Fall Meeting 1993
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Andreas Heise, J.L. Hedrick, et al.
ACS Spring 1999