Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A simple two-state model is developed describing the first hyperpolarizability β. The model is applicable to molecules consisting of an electron donor separated from an electron acceptor by a π-conjugated link. This approach has the advantage of yielding simple algebraic expressions for the hyperpolarizability. The relationship between β0 (the hyperpolarizability extrapolated to zero frequency) and the wavelength of the absorption maximum λmax is shown explicitly. This relationship is consistent with experimental results for p-substituted benzenes. One also obtains an expression relating β0 and the length of the conjugated system connecting donor and acceptor ends of the molecule.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
A. Gangulee, F.M. D'Heurle
Thin Solid Films