M.O. Aboelfotoh, L. Krusin-Elbaum
Journal of Applied Physics
We report a first observation of the remarkably low electrical resistivity of copper germanide thin films formed at temperatures below 200°C. At these low temperatures, the ε-Cu3Ge phase with a monoclinic crystal structure is formed, with room-temperature resistivity which can be as low as 5.5 μΩ cm. The films are electrically stable up to at least 600°C, and, unlike pure copper, are also stable against oxygen and air exposure.
M.O. Aboelfotoh, L. Krusin-Elbaum
Journal of Applied Physics
L. Krusin-Elbaum, G. Blatter, et al.
Physical Review B - CMMP
Ku N. Chen, L. Krusin-Elbaum, et al.
IEEE Electron Device Letters
J.M.E. Harper, S.E. Harnstram, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films