Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
Paper
Publications
24 results for David Seeger
Mechanism of the ultraviolet laser ablation of polymethyl methacrylate at 193 and 248 nm: Laser-induced fluorescence analysis, chemical analysis, and doping studies
- R. Srinivasan
- Bodil Braren
- et al.
- 1986
- Journal of the Optical Society of America B: Optical Physics
PaperLOW TEMPERATURE UV LASER ETCHING OF PMMA: ON THE MECHANISM OF ABLATIVE PHOTODECOMPOSITION (APD).
- Bodil Braren
- David Seeger
- 1986
- Journal of Polymer Science, Part C: Polymer Letters
PaperCOMPARATIVE STUDY OF THE PHOTOCHEMISTRY OF THE CUTTING (ETCHING) OF A SYNTHETIC POLYMER AND BOVINE CORNEA BY EXCIMER LASER RADIATION.
- R. Srinivasan
- Bodil Braren
- et al.
- 1984
- CLEO 1984
Conference paper