Fully self-aligned epitaxial-base transistorR. SchulzM. Jostet al.1989VLSI Technology 1989Conference paper
A new planarization technique, using a combination of RIE and chemical mechanical polish (CMP)B. DavariC. Koburgeret al.1989IEDM 1989Conference paper
On the preparation of cross-sectional TEM samples using lithographic processing and reactive ion-etchingJ.T. WetzelM. Jostet al.1989UltramicroscopyPaper