Publications

3 results for Emil F. Baran

Sub-μm, planarized, Nb-AlO_x-Nb Josephson process for 125 mm wafers developed in partnership with Si technology
- - M.B. Ketchen
  - D.J. Pearson
  - et al.
- 1991
- Applied Physics Letters
Paper
Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate
- - Scott K. Reynolds
  - Christopher J. Smart
  - et al.
- 1991
- Applied Physics Letters
Paper
Two-level metal fully planarized interconnect structure implemented on a 64 kb CMOS SRAM
- - D. Moy
  - M. Schadt
  - et al.
- 1989
- VMIC 1989
Conference paper