Publications

3 results for M. Smyth

Sub-μm, planarized, Nb-AlO_x-Nb Josephson process for 125 mm wafers developed in partnership with Si technology
- - M.B. Ketchen
  - D.J. Pearson
  - et al.
- 1991
- Applied Physics Letters
Paper
Gel resist processing for submicron CMOS and bipolar circuits
- - K.E. Petrillo
  - M. Smyth
  - et al.
- 1989
- Proceedings of SPIE 1989
Conference paper
PICOSECOND ELECTRICAL PULSES FOR VLSI ELECTRONICS CHARACTERIZATION.
- - J.-M. Halbout
  - P.G. May
  - et al.
- 1986
- TMPEO 1986
Conference paper