Nonalloyed ohmic contacts to n-Si using a strained Si0.50Ge 0.50 buffer layerHsing-Kuen LiouEdward S. Yanget al.1993Applied Physics LettersPaper
Formation of stoichiometric SiGe oxide by electron cyclotron resonance plasmaP.W. LiH.K. Liouet al.1992Applied Physics LettersPaper
Interfacial reactions and Schottky barriers of Pt and Pd on epitaxial Si1-xGex alloysH.K. LiouX. Wuet al.1992Applied Physics LettersPaper