Charge trapping and detrapping in HfO2 high-κ MOS capacitors using internal photoemission
- D. Felnhofer
- E. Gusev
- et al.
- 2005
- INFOS 2005
Conference paper
Publications
76 results for E. Gusev
Electrical properties of ultrathin Al2O3 films grown by metalorganic chemical vapor deposition for advanced complementary metal-oxide semiconductor gate dielectric applications
- Spyridon Skordas
- Filippos Papadatos
- et al.
- 2005
- Journal of Materials Research
PaperIn situ investigation of growth and thermal stability of ultrathin Si layers on the HfO 2/Si (100) high- κ dielectric system
- Yu.Yu. Lebedinskii
- A. Zenkevich
- et al.
- 2005
- Applied Physics Letters
PaperReverse short channel effects in high-k gated nMOSFETs
- J.-P. Han
- S.M. Koo
- et al.
- 2005
- Microelectronics Reliability
Conference paperOptical second harmonic generation studies of ultrathin high-k dielectric stacks
- V. Fomenko
- E. Gusev
- et al.
- 2005
- Journal of Applied Physics
PaperStructural, electronic, and dielectric properties of ultrathin zirconia films on silicon
- S. Sayan
- N.V. Nguyen
- et al.
- 2005
- Applied Physics Letters
PaperPotential imaging of Si/HfO2/polycrystalline silicon gate stacks: Evidence for an oxide dipole
- R. Ludeke
- V. Narayanan
- et al.
- 2005
- Applied Physics Letters
PaperThreshold voltage instabilities in high-κ gate dielectric stacks
- Sufi Zafar
- Arvind Kumar
- et al.
- 2005
- IEEE T-DMR
PaperInterfacial oxide formation from intrinsic oxygen in W-HfO2 gated silicon field-effect transistors
- E.J. Preisler
- S. Guha
- et al.
- 2004
- Applied Physics Letters
PaperCharge trapping and annealing in high-k gate dielectrics
- James A. Felix
- Marty R. Shaneyfelt
- et al.
- 2004
- IEEE TNS
Paper