Publications

2 results for H. Yamasaki

A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications
- - S. Krishnan
  - U. Kwon
  - et al.
- 2011
- IEDM 2011
Conference paper
Performance elements for 28nm gate length bulk devices with gate first high-k metal gate
- - Jun Yuan
  - C. Gruensfelder
  - et al.
- 2010
- ICSICT 2010
Conference paper